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Interface trap characterization of Al2O3/GaN MOS capacitors on GaN substrate with surface treatments

任 兵, Jian Huang, SUMIYA, Masatomo, KOIDE, Yasuo, Ke Tang, LIAO, Meiyong, Linjun Wang, SANG, Liwen.
IWN2018. November 11, 2018-November 16, 2018.

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Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2019-03-04 10:09:00 +0900 Updated at: 2019-03-04 10:09:00 +0900

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