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Scalable growth of high-quality MoS2 and WS2 atomic layers using oxychloride sources in MOCVD reactor
ICMOVPE-XIX. 2018.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2018-06-28 16:44:26 +0900Updated at: 2018-06-28 16:44:26 +0900