HOME > Presentation > Detailレーザ加熱型MOCVD装置を用いた狭い温度範囲でのZnO膜のラテラル成長(Very narrow temperature window for lateral growth of ZnO thin films by laser heating metalorganic chemical vapor deposition)原田 善之, 角谷 正友. The 6th Asia-Pacific Workshop on Widegap Semiconductors. 2013.NIMS author(s)SUMIYA, MasatomoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:46:56 +0900Updated at: 2017-07-10 21:37:35 +0900