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Si/GeおよびGe/Siコアシェルナノワイヤ中の選択ドーピングと応力評価
(Characterization of selective doping and stress in Si/Ge and Ge/Si core-shell nanowires)
28th International Conference on Defects in Semiconductors. 2015.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:17:20 +0900Updated at: 2017-07-10 22:11:41 +0900