HOME > Presentation > DetailSelf-limiting Oxygen Vacancy formation into Anatase-TiO2 Films by Trimethylaluminium山本 逸平, 生田目 俊秀, 澤田 朋実, 大井 暁彦, 栗島 一徳, ダオ デュイ タン, 長尾 忠昭, 知京 豊裕, 小椋厚志, 大石知司. 46th IEEE Semiconductor Interface Specialists Conference. 2015.NIMS author(s)NABATAME, ToshihideOHI, AkihikoNAGAO, TadaakiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-01-08 04:40:27 +0900 Updated at :2017-07-10 22:13:42 +0900