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Self-limiting Oxygen Vacancy formation into Anatase-TiO2 Films by Trimethylaluminium

46th IEEE Semiconductor Interface Specialists Conference. 2015.

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Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2017-01-08 04:40:27 +0900 Updated at :2017-07-10 22:13:42 +0900

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