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イオン注入シリコンナノワイヤの再結晶化とドーパンント原子の電気的活性化
(Recrystallization and reactivation of dopant atoms in ion-implanted silicon nanowires)

ICDS27. 2013. Invited

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-01-08 04:35:28 +0900Updated at: 2024-03-05 11:44:35 +0900

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