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Growth of stable amorphous silicon films by gas-flow-controlled RF plasma-enhanced chemical vapour deposition
(ガス流制御RFプラズマCVD法による高安定アモルファスSi膜成長)
23rd Inter. Conf. Amorphous and Nanocrystalline Semiconductors. August 24, 2009-August 28, 2009.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-09-05 12:25:22 +0900Updated at: 2022-09-05 12:25:22 +0900