HOME > Presentation > Detailルチル型TiO2界面層がHfO2/GeMOS構造に与える影響(Effects of Rutile TiO2 Interlayer on HfO2/Ge MOS Structure)小橋 和義, 長田 貴弘, 生田目 俊秀, 山下 良之, 小椋厚志, 知京 豊裕. SSDM 2013. 2013.NIMS author(s)NAGATA, TakahiroNABATAME, ToshihideYAMASHITA, YoshiyukiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-01-08 04:46:37 +0900 Updated at :2017-07-10 21:42:57 +0900