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ルチル型TiO2界面層がHfO2/GeMOS構造に与える影響
(Effects of Rutile TiO2 Interlayer on HfO2/Ge MOS Structure)

SSDM 2013. 2013.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2017-01-08 04:46:37 +0900 Updated at :2017-07-10 21:42:57 +0900

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