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Characteristics of Oxide TFT Using Carbon-Doped Ιn2O3 Thin Film Fabricated By Low-Temperature ALD Using Ιn-Etcp and H2O&O3

小林 陸, NABATAME, Toshihide, 栗島 一徳, 女屋 崇, OHI, Akihiko, IKEDA, Naoki, NAGATA, Takahiro, TSUKAGOSHI, Kazuhito, 小椋 厚志.
236th ECS Meeting. October 13, 2019-October 17, 2019.

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Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2020-10-18 03:00:18 +0900 Updated at: 2020-10-18 03:00:18 +0900

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