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(Suppression of Fatigue Properties of Ferroelectric TiN/HfxZr1−xO2/TiN Capacitors by Surface Oxidation of TiN Bottom-Electrode)

女屋 崇, 生田目 俊秀, 森田 行則, 太田 裕之, 右田 真司, 喜多 浩之, 長田 貴弘, 塚越 一仁, 松川 貴.
第28回電子デバイス界面テクノロジー研究会. February 03, 2023-February 04, 2023.

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Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2023-02-24 17:19:41 +0900Updated at: 2023-02-24 17:19:41 +0900

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