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交流スパッタ法で成膜したNd0.6Sr0.4FeO3薄膜の電気特性
(Electrical Property of Nd0.6Sr0.4FeO3 Thin Film Deposited ByRF Sputtering Method)

W. Namiki, 土屋 敬志, M. Minohara, M. Kobayashi, K. Horiba, H. Kumigashira, T. Higuchi.
International Symposium on Atomic Switch 2017. 2017.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-11-10 22:40:15 +0900Updated at: 2018-06-05 14:14:42 +0900

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