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Al2O3/n-GaNキャパシタの自然酸化膜層が電気特性へ及ぼす影響
(Influence of native oxide layer on electrical characteristics of Al2O3/n-GaN capacitors)

シリコン材料・デバイス研究会 (SDM). 2018.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2018-04-18 22:22:18 +0900 Updated at :2018-06-05 14:19:49 +0900

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