HOME > Presentation > DetailCドープIn-Si-O薄膜トランジスタの負バイアス不安定性(Negative bias stress instability in C-doped In-Si-O thin film transistors)栗島 一徳, 生田目 俊秀, 木津 たきお, 塚越 一仁, 女屋 崇, 大井 暁彦, 池田 直樹, 知京 豊裕, 小椋厚志. ULSIC vs TFT 2017. May 21, 2017-May 25, 2017.NIMS author(s)NABATAME, ToshihideTSUKAGOSHI, KazuhitoONAYA, TakashiOHI, AkihikoIKEDA, NaokiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-04-18 22:54:59 +0900 Updated at: 2018-06-05 14:07:14 +0900