HOME > Published patent applications > Detail[Published patent application] ホイスラー合金薄膜およびその製造方法、磁気抵抗効果素子、磁気メモリ2016-07-25. 2016134520 (Google Patents) NIMS author(s)HONO, KazuhiroSASAKI, TaisukeSAKURABA, YuyaCreated at :2023-07-22 21:45:49 +0900 Updated at :2023-07-22 21:45:49 +0900
