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[Published patent application] リフトオフ法、超微細2次元パターンアレイ及びプラズモンデバイスの製造方法

2016-04-04. 2016046408 (Google Patents) , 6341539

NIMS author(s)


Created at :2023-07-22 21:45:47 +0900 Updated at :2023-07-22 21:45:47 +0900

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