HOME > Published patent applications > Detail[Published patent application] リフトオフ法、超微細2次元パターンアレイ及びプラズモンデバイスの製造方法2016-04-04. 2016046408 (Google Patents) , 6341539NIMS author(s)KASAYA, TakeshiMIYAZAKI, HidekiCreated at :2023-07-22 21:45:47 +0900 Updated at :2023-07-22 21:45:47 +0900