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[Published patent application] 負イオン照射・同時蒸着による膜形成方法とその装置

2001-05-22. 2001140056 (Google Patents) , 3610372

NIMS author(s)

Created at :2023-07-22 21:44:41 +0900 Updated at :2023-07-22 21:44:41 +0900

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