HOME > Misc > DetailRemoval of Si(111) wafer surface etch pits generated in ammonia-peroxide clean step(Si 表面にアンモニア過酸化水素のクリーンなステップで生成されました穴の除去)Zhanwen Xiao, Mingxiang Xu, Taizo Ohgi, Keiko Onishi, Daisuke Fujita. Applied Surface Science 221 [1-4] 160-166. 2004.https://doi.org/10.1016/s0169-4332(03)00876-6 NIMS author(s)ONISHI, KeikoFUJITA, DaisukeFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2020-11-20 10:39:40 +0900 Updated at :2020-11-20 10:39:40 +0900