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Removal of Si(111) wafer surface etch pits generated in ammonia-peroxide clean step
(Si 表面にアンモニア過酸化水素のクリーンなステップで生成されました穴の除去)

Zhanwen Xiao, Mingxiang Xu, Taizo Ohgi, Keiko Onishi, Daisuke Fujita.
Applied Surface Science 221 [1-4] 160-166. 2004.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2020-11-20 10:39:40 +0900 Updated at :2020-11-20 10:39:40 +0900

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