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Removal of Si(1 1 1) wafer surface etch pits generated in ammonia-peroxide clean step

著者Zhanwen Xiao, Mingxiang Xu, Taizo Ohgi, Keiko Onishi, Daisuke Fujita.
掲載誌名Applied Surface Science 221 [1-4] 160-166
出版社Elsevier BV
出版年2004
言語English
DOIhttps://doi.org/10.1016/s0169-4332(03)00876-6
Import To Extrenal ServiceMendeley

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