HOME > その他の文献 > 書誌詳細Effects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading ConditionChiemi Ishiyama, Akinobu Shibata, Masato Sone, Yakichi Higo. Japanese Journal of Applied Physics 49 [6] 06GN14. 2010.https://doi.org/10.1143/jjap.49.06gn14 NIMS著者柴田 曉伸Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-11-20 10:44:26 +0900更新時刻: 2024-04-02 01:08:26 +0900