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論文・分野から探す

機構に所属する研究者の発表した論文を、タイトル・抄録・分野などから検索することができます。論文の分野はクラリベイト社のESI分類を参考に分類しています(Materials Science, Physics, Chemistry, Engineering, Biologyなど)。

最終更新日: 2025年05月16日

43件の論文が見つかりました。論文は出版年月日順に表示しています。(ヘルプ)
  • Masuaki Matsumoto, Tomohiro Okada, Tetsuya Miyazawa, Kazuhiko Mase, Misao Yamanaka, Ayako Hashimoto, Markus Wilde, Katsuyuki Fukutani. Hydrogen incorporation and release from nonevaporable getter coatings based on oxygen-free Pd/Ti thin films. Journal of Vacuum Science & Technology A. 37 [5] (2019) 051601 10.1116/1.5108983
  • Tetsuya Miyazawa, Yu Kano, Yasuo Nakayama, Kenichi Ozawa, Toshiharu Iga, Misao Yamanaka, Ayako Hashimoto, Takashi Kikuchi, Kazuhiko Mase. Improved pumping speeds of oxygen-free palladium/titanium nonevaporable getter coatings and suppression of outgassing by baking under oxygen. Journal of Vacuum Science & Technology A. 37 [2] (2019) 021601 10.1116/1.5074160 Open Access
  • Tetsuya Miyazawa, Masashi Kurihara, Shinya Ohno, Naoya Terashima, Yuto Natsui, Hiroo Kato, Yoshihiro Kato, Ayako Hashimoto, Takashi Kikuchi, Kazuhiko Mase. Oxygen-free palladium/titanium coating, a novel nonevaporable getter coating with an activation temperature of 133 °C. Journal of Vacuum Science & Technology A. 36 [5] (2018) 051601 10.1116/1.5037023
  • Tomomi Sawada, Toshihide Nabatame, Thang Duy Dao, Ippei Yamamoto, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Kazuyuki Kohama, Tomoji Ohishi, Atsushi Ogura, Tadaaki Nagao. Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35 [6] (2017) 061503 10.1116/1.4998425
  • Taku T. Suzuki, Isao Sakaguchi. Analysis of trace n-alkane in air by cryogenic-temperature programmed desorption. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35 [4] (2017) 041401 10.1116/1.4982930
  • Takashi Aizawa, Shigeki Otani, Isao Ohkubo, Takao Mori. ZrC epitaxy on Si(111). Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 33 [6] (2015) 061512 10.1116/1.4930317
  • Jing Zhao, Jia-Ming Lin, Juan Carlos F. Rodríguez-Reyes, Andrew V. Teplyakov. Ferroelectric and magnetic properties of Aurivillius Bim+1Ti3Fem−3O3m+3 thin films. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 33 [6] (2015) 060605 10.1116/1.4926982
  • Kazunori Kurishima, Toshihide Nabatame, Maki Shimizu, Nobuhiko Mitoma, Takio Kizu, Shinya Aikawa, Kazuhito Tsukagoshi, Akihiko Ohi, Toyohiro Chikyow, Atsushi Ogura. Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 33 [6] (2015) 061506 10.1116/1.4928763
  • Michiko Yoshitake, Petr Blumentrit, Slavomir Nemsak. X-ray photoelectron spectroscopic study on interface bonding between Pt and Zn- and O-terminated ZnO. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 31 [2] (2013) 020601 10.1116/1.4772464
  • Atsushi Hozumi, Shuichi Asakura, Akio Fuwa, Naoto Shirahata. Site-selective Electroless Plating on Amino-terminated Diamond Substrate Patterned by 126 nm Vacuum Ultraviolet Light Lithography. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 23 [4] (2005) 1029-1033 10.1116/1.1863937
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