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論文・分野から探す

機構に所属する研究者の発表した論文を、タイトル・抄録・分野などから検索することができます。論文の分野はクラリベイト社のESI分類を参考に分類しています(Materials Science, Physics, Chemistry, Engineering, Biologyなど)。

最終更新日: 2026年10月08日

195件の論文が見つかりました。論文は出版年月日順に表示しています。(ヘルプ)
  • Tokuyuki Teraji, Yasuo Koide, Toshimichi Ito. Schottky barrier height and thermal stability of p-diamond (100) Schottky interfaces. Thin Solid Films. 557 (2014) 241-248 10.1016/j.tsf.2013.11.132
  • Tokuyuki Teraji. Isotopic enrichment of diamond using microwave plasma-assisted chemical vapor deposition with high carbon conversion efficiency. Thin Solid Films. 557 (2014) 231-236 10.1016/j.tsf.2014.01.018
  • Takahiro Nagata, Seungjun Oh, Yoshiyuki Yamashita, Hideki Yoshikawa, Norihiro Ikeno, Keisuke Kobayashi, Toyohiro Chikyow, Yutaka Wakayama. Photoelectron spectroscopic study on band alignment of poly(3-hexylthiophene-2,5-diyl)/polar-ZnO heterointerface. Thin Solid Films. 554 (2014) 194-198 10.1016/j.tsf.2013.08.018
  • Tsuyoshi Ogino, Jesse R. Williams, Ken Watanabe, Isao Sakaguchi, Shunichi Hishita, Hajime Haneda, Yutaka Adachi, Takeshi Ohgaki, Naoki Ohashi. Effect of crystalline polarity on microstructure and optoelectronic properties of gallium-doped zinc oxide films deposited onto glass substrates. Thin Solid Films. 552 (2014) 56-61 10.1016/j.tsf.2013.12.017
  • Katsuhiko Ariga, Taizo Mori, Masaaki Akamatsu, Jonathan P. Hill. Two-dimensional nanofabrication and supramolecular functionality controlled by mechanical stimuli. Thin Solid Films. 554 (2014) 32-40 10.1016/j.tsf.2013.05.060
  • Nao Shinoda, Tetsuya Shimizu, Tso-Fu Mark Chang, Akinobu Shibata, Masato Sone. Cu electroplating using suspension of supercritical carbon dioxide in copper-sulfate-based electrolyte with Cu particles. Thin Solid Films. 529 (2013) 29-33 10.1016/j.tsf.2012.03.089
  • Taiki Uemura, Tso-Fu Mark Chang, Akinobu Shibata, Masato Sone. Abnormally large Ni grains epitaxially grown by electrodeposition on Cu substrate. Thin Solid Films. 529 (2013) 385-388 10.1016/j.tsf.2012.03.062
  • Yoshiaki Kikuchi, Jun Gao, Takahiro Sano, Shun-ichiro Ohmi. Anisotropic high-k deposition for gate-last processing of metal-oxide-semiconductor field-effect transistor utilizing electron-cyclotron-resonance plasma sputtering. Thin Solid Films. 520 [7] (2012) 2989-2993 10.1016/j.tsf.2011.11.055
  • Toshihide Nabatame, Masayuki Kimura, Hiroyuki Yamada, Akihiko Ohi, Tomoji Ohishi, Toyohiro Chikyow. Influence of Oxygen Transfer in Hf-based High-k Dielectrics on Flatband Voltage Shift. Thin Solid Films. 520 [8] (2012) 3387-3391 10.1016/j.tsf.2011.10.086
  • Tsuyoshi Ogino, Naoki Ohashi, Shunichi Hishita, Isao Sakaguchi, Yutaka Adachi, Kunihiko Nakajima, Hajime Haneda. Fabricating transparent waveguide for wireless communication. Thin Solid Films. 520 [10] (2012) 3835-3838 10.1016/j.tsf.2011.10.056
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