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機構に所属する研究者の発表した論文を、タイトル・抄録・分野などから検索することができます。論文の分野はクラリベイト社のESI分類を参考に分類しています(Materials Science, Physics, Chemistry, Engineering, Biologyなど)。

最終更新日: 2024年04月19日

88件の論文が見つかりました。論文は出版年月日順に表示しています。(ヘルプ)
  • Ahmed A. M. El-Amir, Takeo Ohsawa, Satoshi Ishii, Masataka Imura, Hiroyo Segawa, Isao Sakaguchi, Tadaaki Nagao, Kiyoshi Shimamura, Naoki Ohashi. Optoelectronic characteristics of the Ag-doped Si p-n photodiodes prepared by a facile thermal diffusion process. AIP Advances. 9 [5] (2019) 055024 10.1063/1.5091661 Open Access
  • N. H. Nickel, F. Lang, E. G. Villora, K. Shimamura, J. Rappich. Thermal properties of the dominant O – H complex in β-Ga2O3. AIP Advances. 9 [10] (2019) 105026 10.1063/1.5112168 Open Access
  • Masato Kubota, Seisuke Nigo, Seiichi Kato, Kenta Amemiya. Direct observation of electronic structure change by resistance random access memory effect in amorphous alumina. AIP Advances. 9 [9] (2019) 095050 10.1063/1.5086212 Open Access
  • Efi Dwi Indari, Yoshiyuki Yamashita, Ryu Hasunuma, Hiroshi Oji, Kikuo Yamabe. Relationship between electrical properties and interface structures of SiO2/4H-SiC prepared by dry and wet oxidation. AIP Advances. 9 [10] (2019) 105018 10.1063/1.5126050 Open Access
  • Yoshihiro Irokawa, Toshihide Nabatame, Kazuya Yuge, Akira Uedono, Akihiko Ohi, Naoki Ikeda, Yasuo Koide. Investigation of Al2O3/GaN interface properties by sub-bandgap photo-assisted capacitance-voltage technique. AIP Advances. 9 [8] (2019) 085319 10.1063/1.5098489 Open Access
  • Fumikazu Mizutani, Shintaro Higashi, Mari Inoue, Toshihide Nabatame. Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma. AIP Advances. 9 [4] (2019) 045019 10.1063/1.5081727 Open Access
  • Satoshi Kaneko, Shuhei Watanabe, Shinya Kasai, Tomoaki Nishino, Kazuhito Tsukagoshi, Manabu Kiguchi. Near-infrared-light-induced decomposition of Rhodamine B triggered by localized surface plasmon at gold square dimers with well-defined separation distance. AIP Advances. 9 [3] (2019) 035153 10.1063/1.5093763 Open Access
  • Efi Dwi Indari, Yoshiyuki Yamashita, Ryu Hasunuma, Takahiro Nagata, Shigenori Ueda, Kikuo Yamabe. Relationship between band-offset, gate leakage current, and interface states density at SiO2/4H-SiC (000-1) interface. AIP Advances. 9 [4] (2019) 045002 10.1063/1.5088541 Open Access
  • Naoki Fujiwara, Masayoshi Takeuchi, Takanori Kuwayama, Satoshi Nakagawa, Soshi Iimura, Satoru Matsuishi, Hideo Hosono. Pressure-induced quantum critical behavior in LaFeAsO1-xHx studied via NMR. AIP Advances. 8 [10] (2018) 101331 10.1063/1.5042482 Open Access
  • Ahmed A. M. El-Amir, Takeo Ohsawa, Yoshitaka Matsushita, Yoshiki Wada, Kiyoshi Shimamura, Naoki Ohashi. Preparation and some properties of Mg2Si0.53Ge0.47 single crystal and Mg2Si0.53Ge0.47 pn-junction diode. AIP Advances. 8 [11] (2018) 115005 10.1063/1.5056221 Open Access
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