Purity and flatness control of interfaces between silicide and Si by H termination of Si surfaces
(Si表面のH終端化によるシリサイド/Si界面の純度と平坦性の制御)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-11-15 00:39:54 +0900Updated at: 2022-11-15 00:39:54 +0900