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Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
(plasma-enhanced atomic layer deposition法によるRuO2下部電極の表面平滑性の改善及びRuO2/TiO2/Al2O3/TiO2/RuO2キャパシタの特性)

Tomomi Sawada, Toshihide Nabatame, Thang Duy Dao, Ippei Yamamoto, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Kazuyuki Kohama, Tomoji Ohishi, Atsushi Ogura, Tadaaki Nagao.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 [6] 061503. 2017.
https://doi.org/10.1116/1.4998425

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    Created at: 2017-12-12 20:24:06 +0900Updated at: 2024-03-30 02:35:56 +0900

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