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AuthorTomomi Sawada, Toshihide Nabatame, Thang Duy Dao, Ippei Yamamoto, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Kazuyuki Kohama, Tomoji Ohishi, Atsushi Ogura, Tadaaki Nagao.
TitleImprovement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
Journal titleJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 6 061503
ISSN: 15208559 07342101
Year of publication2017
LanguageEnglish
DOI10.1116/1.4998425
ESI category
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