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SiC film formation from fluorosilane gas by plasma CVD
(プラズマCVD法によるフッ化シランからのSiC膜作製)

Hiroshi Suzuki, Hiroshi Araki, Masahiro Tosa, Tetsuji Noda.
Journal of Crystal Growth 294 [2] 464-468. 2006.
https://doi.org/10.1016/j.jcrysgro.2006.07.003

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