Self-Aligned Formation of Sub 1 nm Gaps Utilizing Electromigration during Metal Deposition

Yasuhisa Naitoh; Tatsuhiko Ohata; Ryuji Matsushita; Eri Okawa; Masayo Horikawa; Makiko Oyama; Masakazu Mukaida; Dong F. Wang; Manabu Kiguchi; Kazuhito Tsukagoshi; Takao Ishida; Yasuhisa Naitoh; Tatsuhiko Ohata; Ryuji Matsushita; Eri Okawa; Masayo Horikawa; Makiko Oyama; Masakazu Mukaida; Dong F. Wang; Manabu Kiguchi; Kazuhito Tsukagoshi; Takao Ishida

doi:10.1021/am403115m

Self-Aligned Formation of Sub 1 nm Gaps Utilizing Electromigration during Metal Deposition

Yasuhisa Naitoh, Tatsuhiko Ohata, Ryuji Matsushita, Eri Okawa, Masayo Horikawa, Makiko Oyama, Masakazu Mukaida, Dong F. Wang, Manabu Kiguchi, Kazuhito Tsukagoshi, Takao Ishida.

ACS Applied Materials & Interfaces 5 [24] 12869-12875. 2013.

https://doi.org/10.1021/am403115m

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 17:16:06 +0900 Updated at: 2025-05-20 05:16:19 +0900