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Antiferromagnetic Films and Their Applications

Atsufumi Hirohata, David C. Lloyd, Takahide Kubota, Takeshi Seki, Koki Takanashi, Hiroaki Sukegawa, Zhenchao Wen, Seiji Mitani, Hiroki Koizumi.
IEEE Access 11 117443-117459. 2023.

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    Created at: 2023-12-21 10:20:06 +0900Updated at: 2024-11-07 09:41:16 +0900

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