Molecular modeling of low-k films of carbon-doped silicon oxides for theoretical investigations of the mechanical and dielectric properties
(誘電特性および機械強度特性の理論的解析のための炭素ドープ酸化シリコン膜の分子モデリング)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 15:05:24 +0900Updated at: 2024-04-01 20:59:55 +0900