HOME > Article > DetailReaction and Stability of Metal/Silicide Interface.(金属／シリサイド界面の反応と安定性.)J.P.Sullivan, Toshiyuki Hirano, T.Kameda, J.H.Weaver, J. P. Sullivan, T. Komeda, H. M. Meyer, B. M. Trafas, G. D. Waddill, J. H. Weaver. Applied Physics Letters 56 [7] 671-673. 1990.https://doi.org/10.1063/1.103308 NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 11:31:34 +0900 Updated at: 2026-07-28 04:21:32 +0900
