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Homoepitaxial diamond chemical vapor deposition for ultra-light doping

Author(s)T. Teraji, J. Isoya, K. Watanabe, S. Koizumi, Y. Koide.
Journal titleMaterials Science in Semiconductor Processing 70 197-202
ISSN: 13698001
ESI category: MATERIALS SCIENCE
PublisherElsevier BV
Year of publication2017
LanguageEnglish
DOIhttps://doi.org/10.1016/j.mssp.2016.11.012
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