Growth of stable amorphous silicon films by gas-flow-controlled RF plasma-enhanced chemical vapour deposition
(ガス流制御RFプラズマCVD法による高安定アモルファスSi膜成長)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2018-06-08 20:40:14 +0900Updated at: 2025-03-13 05:57:09 +0900