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X-ray emission induced by 60 keV high-flux negative copper ion implantation
(大電流60 keV負銅イオン注入により誘起されるＸ線放出)

AMEKURA, Hiroshi, Voitsenya V, Lay T T, TAKEDA, Yoshihiko, KISHIMOTO, Naoki.
Japanese Journal of Applied Physics 1094-1096. 2001.

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