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Leakage Current Distribution of Cu-Contaminated Thin SiO2
(銅で汚染されたSiO2薄膜のリーク電流分布)

Norio Tokuda, Takahiro Kanda, Satoshi Yamasaki, Kazushi Miki, Kikuo Yamabe.
Japanese Journal of Applied Physics 42 [Part 2, No. 2B] L160-L162. 2003.
https://doi.org/10.1143/jjap.42.l160

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