HOME > Article > DetailGate tunable magneto-resistance of ultra-thin W Te2devices(Gate Tunable Magneto-resistance of Ultra-Thin WTe2 Devices)Xin Liu, Zhiran Zhang, Chaoyi Cai, Shibing Tian, Satya Kushwaha, Hong Lu, Takashi Taniguchi, Kenji Watanabe, Robert J Cava, Shuang Jia, Jian-Hao Chen. 2D Materials 4 [2] 021018. 2017.https://doi.org/10.1088/2053-1583/aa613b NIMS author(s)TANIGUCHI, TakashiWATANABE, KenjiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-12-12 20:37:43 +0900Updated at: 2024-03-30 01:11:09 +0900