HOME > Article > DetailMicrostructure of annealed Ti48.5Ni(51.5-x)Cux (x=6.2-33.5) thin films(熱処理したTi48.5Ni(51.5-x)Cux (x=6.2-33.5) 薄膜の微細組織)A. Ishida, M. Sato, K. Ogawa. Philosophical Magazine 88 [16] 2427-2438. 2008.https://doi.org/10.1080/14786430802350694 NIMS author(s)ISHIDA, AkiraFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 15:29:52 +0900Updated at: 2024-04-01 20:15:43 +0900