Effect of Introducing β-FeSi<sub>2</sub>Template Layers on Defect Density and Minority Carrier Diffusion Length in Si Region near p-β-FeSi<sub>2</sub>/n-Si Heterointerface | SAMURAI, NIMS Researchers Directory Service

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Effect of Introducing β-FeSi2Template Layers on Defect Density and Minority Carrier Diffusion Length in Si Region near p-β-FeSi2/n-Si Heterointerface
(Effect of Introducing β-FeSi2Template Layers on Defect Density and Minority Carrier Diffusion Length in Si Region near p-β-FeSi2/n-Si Heterointerface)

Hideki Kawakami, Mitsushi Suzuno, Keiichi Akutsu, Jun Chen, Karolin Jiptner, Takashi Sekiguchi, Takashi Suemasu.

Japanese Journal of Applied Physics 50 [4] 041303. 2011.

https://doi.org/10.1143/jjap.50.041303

NIMS author(s)

CHEN, Jun

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 16:35:58 +0900Updated at: 2024-04-02 03:09:52 +0900

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