HOME > Article > DetailHIGH-RATE GROWTH OF HIGH-QUALITY MICROCRYSTALLINE SILICON FILMS FROM PLASMA BY INTERCONNECTED MULTI-HOLLOW CATHODENIIKURA, Chisato, 板垣奈穂, 松田彰久. SURFACE & COATINGS TECHNOLOGY 5463-5467. 2007.NIMS author(s)NIIKURA, ChisatoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-10-21 22:15:08 +0900Updated at: 2022-10-21 22:15:08 +0900