Stress inversion from initial tensile to compressive side during ultrathin oxide growth of the Si(100) surface
(シリコン(１００)極薄酸化膜の成長によって生じた引っ張り応力の逆転現象)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 17:05:00 +0900Updated at: 2025-01-16 05:48:38 +0900