HOME > Article > DetailSuppression of excess oxygen for environmentally stable amorphous In-Si-O thin-film transistorsShinya Aikawa, Nobuhiko Mitoma, Takio Kizu, Toshihide Nabatame, Kazuhito Tsukagoshi. Applied Physics Letters 106 [19] 192103. 2015.https://doi.org/10.1063/1.4921054 NIMS author(s)NABATAME, ToshihideTSUKAGOSHI, KazuhitoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 17:46:13 +0900Updated at: 2024-11-06 04:29:59 +0900
