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シリコン酸化膜成長過程の表面応力変動
(Surface Stress in the Growth of Silicon Oxide Layer)

中村明子(板倉明子), 成島哲也, 北島正弘, 倉科貴之, 寺石和夫他名.
真空 . 1999.

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      Created at: 2022-09-05 10:56:19 +0900 Updated at: 2022-09-05 10:56:19 +0900

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