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Structurally Controlled Large-Area 10 nm Pitch Graphene Nanomesh by Focused Helium Ion Beam Milling

Marek Edward Schmidt, Takuya Iwasaki, Manoharan Muruganathan, Mayeesha Haque, Huynh Van Ngoc, Shinichi Ogawa, Hiroshi Mizuta.
ACS Applied Materials & Interfaces 10 [12] 10362-10368. 2018.
https://doi.org/10.1021/acsami.8b00427

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    Created at: 2018-04-25 20:59:17 +0900Updated at: 2024-10-10 05:33:28 +0900

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