HOME > Article > DetailFormation of hydrogen-boron complexes in boron-doped silicon treated with a high concentration of hydrogen atoms(高濃度水素原子処理によって形成されたボロンドープシリコン中の水素-ボロン複合体の形成)N. Fukata, S. Fukuda, S. Sato, K. Ishioka, M. Kitajima, T. Hishita, K. Murakami. Physical Review B 72 [24] 245209. 2005.https://doi.org/10.1103/physrevb.72.245209 Open Access NIMS author(s)FUKATA, NaokiISHIOKA, KunieFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2016-05-24 14:54:53 +0900 Updated at :2022-01-10 16:13:04 +0900