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Formation of hydrogen-boron complexes in boron-doped silicon treated with a high concentration of hydrogen atoms
(高濃度水素原子処理によって形成されたボロンドープシリコン中の水素-ボロン複合体の形成)

N. Fukata, S. Fukuda, S. Sato, K. Ishioka, M. Kitajima, T. Hishita, K. Murakami.
Physical Review B 72 [24] 245209. 2005.
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    Created at :2016-05-24 14:54:53 +0900 Updated at :2022-01-10 16:13:04 +0900

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