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Effects of nitrogen atom doping on dielectric constants of Hf-based gate oxides

Hiroyoshi Momida, Tomoyuki Hamada, Takenori Yamamoto, Tsuyoshi Uda, Naoto Umezawa, Toyohiro Chikyow, Kenji Shiraishi, Takahisa Ohno.
Applied Physics Letters 88 [11] 112903. 2006.
https://doi.org/10.1063/1.2184991

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