HOME > Article > DetailEnglish Translation of J. Surf. Anal. 24, 192-205(2018), Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam(翻訳,極低角度入射ビームオージェ深さ方向分析によるHfO2/Si基板の分析)OGIWARA, Toshiya, NAGATA, Takahiro, YOSHIKAWA, Hideki. Journal of Surface Analysis [3] 209-220. 2019.https://doi.org/10.1384/jsa NIMS author(s)OGIWARA, ToshiyaNAGATA, TakahiroYOSHIKAWA, HidekiFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2019-04-03 03:00:19 +0900 Updated at :2019-05-10 18:56:07 +0900