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High responsivity in MoS2 phototransistors based on charge trapping HfO2 dielectrics

Roda Nur, Takashi Tsuchiya, Kasidit Toprasertpong, Kazuya Terabe, Shinichi Takagi, Mitsuru Takenaka.

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Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2020-12-21 03:00:18 +0900Updated at: 2024-09-05 05:04:59 +0900

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