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Uncovering the morphological effects of high-energy Ga+ focused ion beam milling on hBN single-photon emitter fabrication

著者Rachael Klaiss, Joshua Ziegler, David Miller, Kara Zappitelli, Kenji Watanabe, Takashi Taniguchi, Benjamín Alemán, Rachael Klaiss, Joshua Ziegler, David Miller, Kara Zappitelli, Benjamín Alemán.
掲載誌名The Journal of Chemical Physics 157 [7] 074703
ISSN: 00219606
ESIでのカテゴリ: CHEMISTRY
出版社AIP Publishing
発表年2022
言語English
DOIhttps://doi.org/10.1063/5.0097581
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