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Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride
(Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride)

Author(s)Mitsuhiro Okada, Takumi Sawazaki, Kenji Watanabe, Takashi Taniguch, Hiroki Hibino, Hisanori Shinohara, Ryo Kitaura.
Journal titleACS Nano 8 [8] 8273-8277
ISSN: 1936086X, 19360851
ESI category: MATERIALS SCIENCE
PublisherAmerican Chemical Society (ACS)
Year of publication2014
LanguageEnglish
DOIhttps://doi.org/10.1021/nn503093k
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