Structural analysis and electrical properties of pure Ge<sub>3</sub>N<sub>4</sub> dielectric layers formed by an atmospheric-pressure nitrogen plasma

Ryoma Hayakawa; Masashi Yoshida; Kouta Ide; Yoshiyuki Yamashita; Hideki Yoshikawa; Keisuke Kobayashi; Shunsuke Kunugi; Tsuyoshi Uehara; Norifumi Fujimura; Ryoma Hayakawa; Masashi Yoshida; Kouta Ide; Yoshiyuki Yamashita; Hideki Yoshikawa; Keisuke Kobayashi; Shunsuke Kunugi; Tsuyoshi Uehara; Norifumi Fujimura

doi:10.1063/1.3638133

Structural analysis and electrical properties of pure Ge3N4 dielectric layers formed by an atmospheric-pressure nitrogen plasma
(Structural analysis and electrical properties of pure Ge3N4 dielectric layers formed by an atmospheric-pressure nitrogen plasma)

Ryoma Hayakawa, Masashi Yoshida, Kouta Ide, Yoshiyuki Yamashita, Hideki Yoshikawa, Keisuke Kobayashi, Shunsuke Kunugi, Tsuyoshi Uehara, Norifumi Fujimura.

Journal of Applied Physics 110 [6] 064103. 2011.

https://doi.org/10.1063/1.3638133

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 16:28:20 +0900Updated at: 2024-03-31 15:58:33 +0900

Structural analysis and electrical properties of pure Ge3N4 dielectric layers formed by an atmospheric-pressure nitrogen plasma(Structural analysis and electrical properties of pure Ge3N4 dielectric layers formed by an atmospheric-pressure nitrogen plasma)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Structural analysis and electrical properties of pure Ge3N4 dielectric layers formed by an atmospheric-pressure nitrogen plasma
(Structural analysis and electrical properties of pure Ge3N4 dielectric layers formed by an atmospheric-pressure nitrogen plasma)